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X-ray photoelectron spectroscopy
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X-ray photoelectron spectroscopy
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive quantitative spectroscopic technique that measures the very topmost 50–60 atoms, 5–10 nm of any surface. It belongs to the family of photoemission spectroscopies in which electron population spectra are obtained by irradiating a material with a beam of X-rays. XPS is based on the photoelectric effect that can identify the elements that exist within a material (elemental composition) or are covering its surface, as well as their chemical state, and the overall electronic structure and density of the electronic states in the material. XPS is a powerful measurement technique because it not only shows what elements are present, but also what other elements they are bonded to. The technique can be used in line profiling of the elemental composition across the surface, or in depth profiling when paired with ion-beam etching. It is often applied to study chemical processes in the materials in their as-received state or after cleavage, scraping, exposure to heat, reactive gasses or solutions, ultraviolet light, or during ion implantation.
Chemical states are inferred from the measurement of the kinetic energy and the number of the ejected electrons. XPS requires high vacuum (residual gas pressure p ~ 10−6 Pa) or ultra-high vacuum (p < 10−7 Pa) conditions, although a current area of development is ambient-pressure XPS, in which samples are analyzed at pressures of a few tens of millibar.
When laboratory X-ray sources are used, XPS easily detects all elements except hydrogen and helium. The detection limit is in the parts per thousand range, but parts per million (ppm) are achievable with long collection times and concentration at top surface.
XPS is routinely used to analyze inorganic compounds, metal alloys, polymers, elements, catalysts, glasses, ceramics, paints, papers, inks, woods, plant parts, make-up, teeth, bones, medical implants, bio-materials, coatings, viscous oils, glues, ion-modified materials and many others. Somewhat less routinely XPS is used to analyze the hydrated forms of materials such as hydrogels and biological samples by freezing them in their hydrated state in an ultrapure environment, and allowing multilayers of ice to sublime away prior to analysis.
Because the energy of an X-ray with particular wavelength is known (for Al Kα X-rays, Ephoton = 1486.7 eV), and because the emitted electrons' kinetic energies are measured, the electron binding energy of each of the emitted electrons can be determined by using the photoelectric effect equation,
where Ebinding is the binding energy of the electron measured relative to the chemical potential, Ephoton is the energy of the X-ray photons being used, Ekinetic is the kinetic energy of the electron as measured by the instrument and is a work function-like term for the specific surface of the material, which in real measurements includes a small correction by the instrument's work function because of the contact potential. This equation is essentially a conservation of energy equation. The work function-like term can be thought of as an adjustable instrumental correction factor that accounts for the few eV of kinetic energy given up by the photoelectron as it gets emitted from the bulk and absorbed by the detector. It is a constant that rarely needs to be adjusted in practice.
In 1887, Heinrich Rudolf Hertz discovered but could not explain the photoelectric effect, which was later explained in 1905 by Albert Einstein (Nobel Prize in Physics 1921). Two years after Einstein's publication, in 1907, P.D. Innes experimented with a Röntgen tube, Helmholtz coils, a magnetic field hemisphere (an electron kinetic energy analyzer), and photographic plates, to record broad bands of emitted electrons as a function of velocity, in effect recording the first XPS spectrum. Other researchers, including Henry Moseley, Rawlinson and Robinson, independently performed various experiments to sort out the details in the broad bands.[citation needed] After WWII, Kai Siegbahn and his research group in Uppsala (Sweden) developed several significant improvements in the equipment, and in 1954 recorded the first high-energy-resolution XPS spectrum of cleaved sodium chloride (NaCl), revealing the potential of XPS. A few years later in 1967, Siegbahn published a comprehensive study of XPS, bringing instant recognition of the utility of XPS and also the first hard X-ray photoemission experiments, which he referred to as Electron Spectroscopy for Chemical Analysis (ESCA). In cooperation with Siegbahn, a small group of engineers (Mike Kelly, Charles Bryson, Lavier Faye, Robert Chaney) at Hewlett-Packard in the US, produced the first commercial monochromatic XPS instrument in 1969. Siegbahn received the Nobel Prize for Physics in 1981, to acknowledge his extensive efforts to develop XPS into a useful analytical tool. In parallel with Siegbahn's work, David Turner at Imperial College London (and later at Oxford University) developed ultraviolet photoelectron spectroscopy (UPS) for molecular species using helium lamps.
A typical XPS spectrum is a plot of the number of electrons detected at a specific binding energy. Each element produces a set of characteristic XPS peaks. These peaks correspond to the electron configuration of the electrons within the atoms, e.g., 1s, 2s, 2p, 3s, etc. The number of detected electrons in each peak is directly related to the amount of element within the XPS sampling volume. To generate atomic percentage values, each raw XPS signal is corrected by dividing the intensity by a relative sensitivity factor (RSF), and normalized over all of the elements detected. Since hydrogen is not detected, these atomic percentages exclude hydrogen.
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X-ray photoelectron spectroscopy
X-ray photoelectron spectroscopy (XPS) is a surface-sensitive quantitative spectroscopic technique that measures the very topmost 50–60 atoms, 5–10 nm of any surface. It belongs to the family of photoemission spectroscopies in which electron population spectra are obtained by irradiating a material with a beam of X-rays. XPS is based on the photoelectric effect that can identify the elements that exist within a material (elemental composition) or are covering its surface, as well as their chemical state, and the overall electronic structure and density of the electronic states in the material. XPS is a powerful measurement technique because it not only shows what elements are present, but also what other elements they are bonded to. The technique can be used in line profiling of the elemental composition across the surface, or in depth profiling when paired with ion-beam etching. It is often applied to study chemical processes in the materials in their as-received state or after cleavage, scraping, exposure to heat, reactive gasses or solutions, ultraviolet light, or during ion implantation.
Chemical states are inferred from the measurement of the kinetic energy and the number of the ejected electrons. XPS requires high vacuum (residual gas pressure p ~ 10−6 Pa) or ultra-high vacuum (p < 10−7 Pa) conditions, although a current area of development is ambient-pressure XPS, in which samples are analyzed at pressures of a few tens of millibar.
When laboratory X-ray sources are used, XPS easily detects all elements except hydrogen and helium. The detection limit is in the parts per thousand range, but parts per million (ppm) are achievable with long collection times and concentration at top surface.
XPS is routinely used to analyze inorganic compounds, metal alloys, polymers, elements, catalysts, glasses, ceramics, paints, papers, inks, woods, plant parts, make-up, teeth, bones, medical implants, bio-materials, coatings, viscous oils, glues, ion-modified materials and many others. Somewhat less routinely XPS is used to analyze the hydrated forms of materials such as hydrogels and biological samples by freezing them in their hydrated state in an ultrapure environment, and allowing multilayers of ice to sublime away prior to analysis.
Because the energy of an X-ray with particular wavelength is known (for Al Kα X-rays, Ephoton = 1486.7 eV), and because the emitted electrons' kinetic energies are measured, the electron binding energy of each of the emitted electrons can be determined by using the photoelectric effect equation,
where Ebinding is the binding energy of the electron measured relative to the chemical potential, Ephoton is the energy of the X-ray photons being used, Ekinetic is the kinetic energy of the electron as measured by the instrument and is a work function-like term for the specific surface of the material, which in real measurements includes a small correction by the instrument's work function because of the contact potential. This equation is essentially a conservation of energy equation. The work function-like term can be thought of as an adjustable instrumental correction factor that accounts for the few eV of kinetic energy given up by the photoelectron as it gets emitted from the bulk and absorbed by the detector. It is a constant that rarely needs to be adjusted in practice.
In 1887, Heinrich Rudolf Hertz discovered but could not explain the photoelectric effect, which was later explained in 1905 by Albert Einstein (Nobel Prize in Physics 1921). Two years after Einstein's publication, in 1907, P.D. Innes experimented with a Röntgen tube, Helmholtz coils, a magnetic field hemisphere (an electron kinetic energy analyzer), and photographic plates, to record broad bands of emitted electrons as a function of velocity, in effect recording the first XPS spectrum. Other researchers, including Henry Moseley, Rawlinson and Robinson, independently performed various experiments to sort out the details in the broad bands.[citation needed] After WWII, Kai Siegbahn and his research group in Uppsala (Sweden) developed several significant improvements in the equipment, and in 1954 recorded the first high-energy-resolution XPS spectrum of cleaved sodium chloride (NaCl), revealing the potential of XPS. A few years later in 1967, Siegbahn published a comprehensive study of XPS, bringing instant recognition of the utility of XPS and also the first hard X-ray photoemission experiments, which he referred to as Electron Spectroscopy for Chemical Analysis (ESCA). In cooperation with Siegbahn, a small group of engineers (Mike Kelly, Charles Bryson, Lavier Faye, Robert Chaney) at Hewlett-Packard in the US, produced the first commercial monochromatic XPS instrument in 1969. Siegbahn received the Nobel Prize for Physics in 1981, to acknowledge his extensive efforts to develop XPS into a useful analytical tool. In parallel with Siegbahn's work, David Turner at Imperial College London (and later at Oxford University) developed ultraviolet photoelectron spectroscopy (UPS) for molecular species using helium lamps.
A typical XPS spectrum is a plot of the number of electrons detected at a specific binding energy. Each element produces a set of characteristic XPS peaks. These peaks correspond to the electron configuration of the electrons within the atoms, e.g., 1s, 2s, 2p, 3s, etc. The number of detected electrons in each peak is directly related to the amount of element within the XPS sampling volume. To generate atomic percentage values, each raw XPS signal is corrected by dividing the intensity by a relative sensitivity factor (RSF), and normalized over all of the elements detected. Since hydrogen is not detected, these atomic percentages exclude hydrogen.
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