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Tetramethyl orthosilicate
Tetramethyl orthosilicate
Tetramethyl orthosilicate
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Tetramethyl orthosilicate
Names
IUPAC name
Tetramethyl orthosilicate
Other names
  • Tetramethyl orthosilicate
  • Methyl silicate
  • Silicic acid, tetramethyl ester
  • Silicon methoxide
  • TMOS
Identifiers
3D model (JSmol)
ChemSpider
ECHA InfoCard 100.010.598 Edit this at Wikidata
UNII
  • InChI=1S/C4H12O4Si/c1-5-9(6-2,7-3)8-4/h1-4H3 checkY
    Key: LFQCEHFDDXELDD-UHFFFAOYSA-N checkY
  • InChI=1/C4H12O4Si/c1-5-9(6-2,7-3)8-4/h1-4H3
    Key: LFQCEHFDDXELDD-UHFFFAOYAT
  • CO[Si](OC)(OC)OC
Properties
Si(OCH3)4
Molar mass 152.221 g·mol−1
Appearance colourless liquid
Density 1.032
Melting point 4 to 5 °C (39 to 41 °F; 277 to 278 K)
Boiling point 121 to 122 °C (250 to 252 °F; 394 to 395 K)
organic solvents
Vapor pressure 12 mmHg (25°C)[1]
Hazards
Occupational safety and health (OHS/OSH):
Main hazards
 toxic
Flash point 96 °C; 205 °F; 369 K[1]
NIOSH (US health exposure limits):
PEL (Permissible)
 none[1]
REL (Recommended)
 TWA 1 ppm (6 mg/m3)[1]
IDLH (Immediate danger)
 N.D.[1]
Related compounds
Other cations
 Tetraethyl orthosilicate
Trimethyl borate
Trimethyl phosphite
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
checkY verify (what is checkY☒N ?)

Tetramethyl orthosilicate (TMOS) is the chemical compound with the formula Si(OCH3)4. This molecule consists of four methoxy groups bonded to a silicon atom. It is the tetramethyl ester of orthosilicic acid. The basic properties are similar to the more popular tetraethyl orthosilicate, which is usually preferred because the product of hydrolysis, ethanol, is less toxic than methanol.

Tetramethyl orthosilicate hydrolyzes to SiO2:

Si(OCH3)4 + 2 H2O → SiO2 + 4 CH3OH

In organic synthesis, Si(OCH3)4 has been used to convert ketones and aldehydes to the corresponding ketals and acetals, respectively.[2]

Safety

[edit]

The hydrolysis of Si(OCH3)4 produces insoluble SiO2 and CH3OH (methanol). Even at low concentrations inhalation causes lung lesions, and at slightly higher concentrations eye contact with the vapor causes blindness[citation needed]. At low concentrations (200 ppm per 15 min) the damage is often insidious, with onset of symptoms hours after exposure.[3] The mode of action is the precipitation of silica in the eyes and/or lungs[citation needed]. Contrary to common information, including several erroneous MSDS sheets, the methanol produced is only a risk through chronic exposure and is a comparatively small concern. The mechanisms of methanol toxicity are well established, methanol causes blindness via conversion to formaldehyde, then to toxic formic acid in the liver; methanol splashes to the eye cause only moderate and reversible eye irritation.[4]

References

[edit]
[edit]
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Tetramethyl orthosilicate

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from Grokipedia
Tetramethyl orthosilicate, commonly abbreviated as TMOS and also known as tetramethoxysilane, is an organosilicon compound with the molecular formula Si(OCH₃)₄ or C₄H₁₂O₄Si. This tetrahedral molecule features a central atom bonded to four methoxy (-OCH₃) groups and exists as a clear, colorless with low at . With a molecular weight of 152.22 g/mol, it serves as a key precursor in silica-based materials synthesis due to its hydrolytic reactivity. TMOS exhibits notable physical properties including a of 121–122 °C, a of -4 °C, and a density of 1.023 g/mL at 25 °C. It is insoluble in yet highly reactive toward moisture, undergoing to form and , which facilitates its into silica networks. The compound is flammable, with a of 26 °C (closed cup) and a of 13 hPa at 20 °C, and it has a of 1.368 at 20 °C. These characteristics render TMOS moisture-sensitive and require careful handling to prevent unintended reactions. As a versatile chemical intermediate, tetramethyl orthosilicate is primarily utilized as a silica source in sol-gel processes for synthesizing silicates, aerogels, and hexagonal mesoporous silica layers. It plays a critical role in the production of sealants, materials, and organic silicon compounds, as well as in surface modification of nanoparticles and the preparation of nanocrystals. Additional applications include its use as an optical treating agent, coagulant in , mold binder, and component in corrosion-resistant coatings and catalyst formulations. Due to its toxicity and irritant nature—causing severe eye damage, skin irritation, and respiratory hazards—TMOS is classified as a dangerous substance requiring protective equipment and proper storage as a .

Chemical Identity

Formula and Structure

Tetramethyl orthosilicate, also known as tetramethoxysilane, has the molecular formula \ceSi(OCH3)4\ce{Si(OCH3)4}, which can also be written as (\ceCH3O)4\ceSi(\ce{CH3O})4\ce{Si}. This composition includes one atom and four methoxy groups, resulting in a total of four carbon atoms, twelve atoms, and four oxygen atoms, corresponding to the \ceC4H12O4Si\ce{C4H12O4Si}. The molecule features a central atom covalently bonded to four methoxy (−\ceOCH3-\ce{OCH3}) groups, forming a tetrahedral around the silicon center with bond angles approximately 109.5°. This structure is confirmed by studies in the gas phase, which reveal a roughly tetrahedral arrangement consistent with the sp³ hybridization of the silicon atom. The molecular weight of tetramethyl orthosilicate is 152.22 g/mol, calculated from the atomic masses of its constituent elements. In comparison to analogous orthosilicates, such as (TEOS) with the formula \ceSi(OC2H5)4\ce{Si(OC2H5)4}, tetramethyl orthosilicate possesses shorter methyl alkyl chains rather than ethyl groups, which influences its volatility and hydrolysis kinetics while maintaining the same tetrahedral core.

Nomenclature

Tetramethoxysilane is the systematic name for the compound, reflecting its structure as a atom bonded to four methoxy groups. The is tetramethyl silicate. Commonly referred to as tetramethyl orthosilicate or TMOS, it is also known as methyl silicate. The abbreviation TMOS is widely used in for brevity. The prefix "ortho" in tetramethyl orthosilicate denotes its derivation from , Si(OH)4, distinguishing it from partially condensed or dehydrated forms; this convention, established in the mid-19th century, signifies the acid with the maximum water content or hydration degree. The assigned to the compound is 681-84-5. Additional synonyms documented in chemical databases include tetramethyl ester, silicon methoxide, and methyl orthosilicate.

Physical Properties

Appearance and Basic Characteristics

Tetramethyl orthosilicate is a colorless, clear at standard conditions. It exhibits a mild, ethereal . The compound has a of 1.032 g/cm³ at 20 °C. Its ranges from 1.3670 to 1.3700 at 20 °C (589 nm). The is 26 °C (closed cup). Tetramethyl orthosilicate is insoluble in (hydrolyzes on contact) but it is soluble in organic solvents such as , acetone, and .

Thermodynamic Data

Tetramethyl orthosilicate exhibits the following key thermodynamic properties relevant to its handling and storage. Its melting point is -4 °C, indicating it exists as a liquid near room temperature under typical ambient conditions. The boiling point is 121–122 °C at standard atmospheric pressure (760 mmHg), reflecting moderate volatility suitable for distillation processes. Vapor pressure data underscore its potential for in open systems. At 25 °C, the vapor pressure is 12 mmHg, which facilitates its use in vapor deposition but necessitates controlled environments to prevent unintended losses.
PropertyValueConditionsSource
41.4 kJ/molStandard conditionsNIST WebBook
(liquid)240.5 J/mol·K298.15 KNIST WebBook
Under standard dry conditions, tetramethyl orthosilicate remains stable, showing no significant decomposition in air devoid of moisture.

Synthesis

Industrial Methods

The primary industrial method for producing tetramethyl orthosilicate (TMOS), also known as tetramethoxysilane, involves the alcoholysis of (SiCl₄) with (CH₃OH) in the presence of a base to neutralize the byproduct (HCl). The reaction proceeds as SiCl₄ + 4 CH₃OH → Si(OCH₃)₄ + 4 HCl, typically requiring excess methanol or an added base such as to facilitate the process by forming . This method, first developed in 1846 by J. von Ebelmen through the reaction of SiCl₄ with alcohols, remains the cornerstone of commercial production due to its scalability and established infrastructure. The process is conducted under strictly anhydrous conditions to avoid premature of the moisture-sensitive product, with the reaction mixture often carried out at controlled temperatures around 0–25°C to manage the exothermic nature and HCl evolution. Post-reaction, the crude TMOS is purified via under reduced pressure, yielding high-purity product suitable for industrial applications. However, this route faces challenges from the and corrosivity of SiCl₄, which is itself produced energy-intensively via carbothermal reduction of silica, along with HCl . An alternative commercial approach involves direct synthesis from silica (SiO₂)-rich minerals, such as or industrial silica sources, reacting with supercritical in a continuous flow reactor. This method employs a base like (KOH) at elevated conditions of approximately 270°C and 100 atm, with removal via molecular sieves (e.g., 3 Å ) to drive the equilibrium toward TMOS formation, achieving yields up to 20.4 g/L from . Developed as a more sustainable SiCl₄-free process in the late 20th and early 21st centuries, it leverages abundant raw materials and reduces hazardous byproducts, though it requires specialized high-pressure equipment. Historically, TMOS production evolved from early ester syntheses in the mid-19th century, gaining prominence in the mid-20th century alongside the growth of the industry, where alkoxysilanes served as precursors for . These methods have been refined to support large-scale output, with the SiCl₄ route dominating due to its integration with existing facilities.

Laboratory Preparation

Tetramethyl orthosilicate (TMOS) is commonly prepared in the laboratory by reacting silicon tetrachloride (SiCl₄) with excess anhydrous methanol (CH₃OH). The reaction proceeds as follows: SiCl₄ + 4 CH₃OH → Si(OCH₃)₄ + 4 HCl, producing hydrogen chloride as a byproduct that must be efficiently removed to drive the equilibrium forward and prevent side reactions. To manage the highly exothermic nature of the process, SiCl₄ is added slowly to the methanol at controlled low temperatures, typically between 0°C and 5°C, often under an inert atmosphere such as dry nitrogen or with a stream of dry air to facilitate HCl removal. An HCl acceptor like pyridine or dimethylaniline may be employed to neutralize the acid, followed by filtration to remove salts. This method provides good yields under controlled conditions. All manipulations require strict conditions, as TMOS is highly sensitive to and undergoes rapid to form and , potentially leading to contamination or gelation. An alternative laboratory route involves direct synthesis from silica (SiO₂) or silica-containing materials and under catalytic conditions. For instance, silica reacts with in the presence of a base catalyst such as (KOH) at elevated temperatures around 260°C, often with added dehydrating agents like 2,2-dimethoxypropane or under CO₂ pressure (up to 2 MPa) to shift the equilibrium by removing water. This method has been demonstrated on small scales (250 mL to 1 L) using natural silica sources like rice hull ash, yielding up to 59% TMOS after 48 hours. Regardless of the synthetic route, the crude TMOS is purified by under reduced pressure (typically 20–50 mmHg) to separate it from unreacted , HCl residues, or partial methoxy derivatives, achieving purities greater than 98%. This step is crucial for research applications, where high purity minimizes unwanted during subsequent use. Purification achieves high yields for the SiCl₄ route, with challenges primarily arising from moisture ingress and byproduct handling.

Chemical Properties

Hydrolysis Reaction

Tetramethyl orthosilicate (TMOS), Si(OCH₃)₄, undergoes in the presence of , leading to the formation of silica and as the primary products. The overall simplified reaction is represented as: Si(OCH3)4+2H2O→SiO2+4CH3OH\text{Si(OCH}_3)_4 + 2 \text{H}_2\text{O} \rightarrow \text{SiO}_2 + 4 \text{CH}_3\text{OH} This equation captures the net transformation but oversimplifies the process, which proceeds stepwise through siloxane intermediates such as monomeric and oligomeric silanols before ultimate condensation to SiO₂. The mechanism involves nucleophilic attack by on the central atom, resulting in the sequential replacement of methoxy groups (-OCH₃) with hydroxy groups (-OH). In acid-catalyzed conditions, the process begins with rapid of a methoxy oxygen, enhancing the electrophilicity of and facilitating SN2-like displacement by to form a pentacoordinate ; then yields the and releases . Under base , ion (OH⁻) directly attacks , forming a pentacoordinate intermediate that expels methoxide (CH₃O⁻), again leading to stepwise substitution; computational studies confirm involvement of penta- and hexacoordinate structures in the transition states, with nucleophiles approaching from opposite sides to the . Both pathways are bimolecular and invert the configuration during each substitution step. Kinetically, TMOS hydrolysis is rapid in aqueous media due to high water availability, with pseudo- rates observed under excess water conditions, but proceeds more slowly in controlled sol-gel environments where water-to-silicon ratios and alcohol solvents moderate reactivity. The reaction exhibits strong dependence: accelerates with increasing proton concentration (rate slope +1 in log-log plots below neutral ), while base shows first-order dependence on (slope +1 above neutral ), though overall rates can vary with specific catalysts like . Hydration levels and solvent polarity further influence rates, with as solvent promoting faster initial steps compared to . The primary byproduct of TMOS hydrolysis is methanol (CH₃OH), released in equimolar amounts to the displaced methoxy groups, which poses toxicity risks due to its metabolic conversion to and .

Reactions in Organic Synthesis

Tetramethyl orthosilicate (TMOS), with the formula Si(OCH₃)₄, serves as a in the of carbonyl groups by converting ketones and aldehydes into their corresponding ketals and acetals, functioning as both a source of methanol and a dehydrating agent to drive the equilibrium forward. A prominent application of TMOS in is its role in direct amidation reactions, where it facilitates the coupling of carboxylic acids with amines or to form amides, accompanied by the elimination of . This method is particularly effective for both aliphatic and aromatic substrates, such as acetic acid with or with aniline, achieving yields ranging from very good to excellent (up to 98%). The amidation proceeds under reflux in toluene, without the need for additional catalysts or activating agents like carbodiimides commonly used in traditional protocols. This approach offers advantages including operational simplicity, high atom economy, and reduced waste, as TMOS is inexpensive and the byproduct silica gel can be inert or recyclable in some contexts.

Applications

Sol-Gel and Materials Science

Tetramethyl orthosilicate (TMOS), with the formula Si(OCH₃)₄, functions as a key silica precursor in sol-gel polymerization, where it undergoes acid- or base-catalyzed hydrolysis followed by condensation to form extended SiO₂ networks. This process begins with the nucleophilic attack of water on the silicon atom, cleaving methoxy groups and generating silanol (Si-OH) species that subsequently link via siloxane (Si-O-Si) bonds, yielding silica gels or monolithic structures suitable for materials fabrication. The versatility of TMOS in this role stems from its high reactivity, allowing precise control over gelation kinetics and microstructure formation at ambient temperatures, which is advantageous for producing homogeneous silica materials without high-energy sintering. In the synthesis of mesoporous silica, TMOS is employed as the silica source in surfactant-templated processes, enabling the formation of ordered structures like , which features hexagonal arrays of uniform pores typically 2-10 nm in diameter. such as cetyltrimethylammonium bromide (CTAB) or block copolymers like self-assemble into micelles that direct the condensation of hydrolyzed TMOS around them, creating a silica framework after template removal via or extraction. This method yields high surface area materials (often >800 m²/g) with tunable pore sizes, ideal for applications in adsorption and , and TMOS's rapid supports efficient templating under mild conditions compared to alternative precursors. TMOS also enables the doping of silica matrices with metal ions during sol-gel , incorporating elements to produce advanced composites with enhanced properties. This doping approach leverages TMOS's compatibility with aqueous metal solutions, facilitating uniform incorporation at low concentrations without . Relative to (TEOS), TMOS provides distinct advantages in sol-gel applications, including faster and gelation rates attributable to the smaller methoxy ligands, which reduce steric hindrance and enhance nucleophilic accessibility to the center. rate constants for TMOS are approximately 2-3 times higher than for TEOS under acidic conditions, leading to quicker network formation and potentially denser gels. Additionally, TMOS generates as the alcohol byproduct rather than , which has a lower (64.7°C vs. 78.4°C) and evaporates more readily, minimizing residual solvents in the final material and simplifying post-processing steps.

Coatings and Adhesives

Tetramethoxysilane (TMOS), also known as tetramethyl orthosilicate, serves as a key precursor in the formulation of heat- and chemical-resistant coatings through sol-gel processes, where it undergoes to form durable silica-based networks. In these applications, TMOS is hydrolyzed in an acidic medium and applied via spin- or dip-coating onto substrates such as plastics, metals, and , followed by curing to produce transparent layers with enhanced abrasion resistance and . For instance, hybrid coatings combining TMOS with triethoxysilylated on and substrates demonstrate significantly lower wear rates compared to uncoated materials, providing protection against mechanical and environmental degradation. TMOS is also utilized in silicone adhesives and as a component in precision casting molds, where its role as a cross-linking agent improves and structural . In -based adhesives, TMOS acts as a coupling agent that enhances bonding between organic polymers and inorganic fillers, contributing to formulations that withstand high temperatures and chemical exposure. Organic-inorganic hybrid materials derived from TMOS blended with polymers, such as or polyethyleneimine, offer improved durability in protective coatings and adhesive systems by leveraging the silica networks for enhanced mechanical stability and corrosion resistance. These hybrids are prepared through of TMOS, which generates cross-linked Si-O networks directly on substrates, promoting strong interfacial and resistance to harsh conditions without compromising flexibility. Such formulations are particularly valuable in applications requiring long-term performance, like coatings on metallic implants or structural adhesives.

Other Industrial Uses

Tetramethyl orthosilicate (TMOS) serves as a precursor in (CVD) processes for depositing high-purity (SiO₂) insulating layers in manufacturing. In plasma-enhanced CVD (PECVD), TMOS provides the silicon source for SiOₓ films, which function as interlayers and protective coatings for integrated circuits, exhibiting low carbon residue, high transparency (90% in 400–800 nm range), and up to 8H on substrates. The volatility of TMOS facilitates uniform growth in vapor-phase applications. TMOS functions as an intermediate in silicone polymer synthesis, particularly as a crosslinking agent in the production of rubbers. It enhances the mechanical properties and durability of -based materials by forming stable Si-O bonds during . As of 2025, the global TMOS market is valued at 180–230 million USD, with significant growth in driven by fabrication demands. New electronic-grade TMOS production capacities, such as Silanon's 2,000 tons/year facility completing in 2025, underscore expanding use in high-purity SiO₂ layers for advanced chips. Market projections indicate a CAGR of 4.5–6.5% through 2030, fueled by Asia-Pacific expansions, including optics-related applications in precision coatings.

Safety and Toxicology

Health Hazards

Tetramethyl orthosilicate poses significant health risks primarily through and , with additional hazards from and . It is classified as fatal if inhaled due to its vapors causing severe respiratory distress. The compound rapidly hydrolyzes in the presence of moisture to produce and , exacerbating effects through methanol's well-known toxicity. Exposure via inhalation irritates the respiratory tract, potentially causing , cough, and shortness of breath; methanol from can lead to insidious , visual disturbances, and blindness even at relatively low concentrations. Ingestion results in , , gastrointestinal upset, , and weakness, with methanol contributing to and damage that may cause permanent vision loss. Skin contact provokes irritation and possible absorption leading to systemic effects, while eye exposure causes serious damage, including corneal and risk of blindness. In animal studies, the oral LD50 in rats exceeds 2,500 mg/kg, indicating low acute oral , while the inhalation LC50 is 0.39 mg/L over 4 hours in rats, underscoring high vapor . Subchronic inhalation exposure in rats at concentrations above 15 ppm induced histopathological lesions in the , such as epithelial ulceration, , and , suggesting potential for chronic respiratory damage from repeated exposure. Chronic risks may include ongoing methanol-related effects like impaired vision and issues.

Handling and Exposure Limits

Tetramethyl orthosilicate, also known as methyl silicate, has established occupational exposure limits to minimize health risks during handling. The National Institute for Occupational Safety and Health (NIOSH) recommends a time-weighted average (TWA) exposure limit of 1 ppm (6 mg/m³) over a 10-hour workday, while the Occupational Safety and Health Administration (OSHA) permissible exposure limit (PEL) is not established, referring to Appendix G for guidance. The immediately dangerous to life or health (IDLH) concentration has not been determined. Proper storage is essential to prevent and maintain stability. The compound should be kept in a dry, cool, well-ventilated area under , in tightly sealed containers to exclude moisture, acids, and oxidizing materials. Handling must occur in a or well-ventilated space to avoid vapor , using non-sparking tools to mitigate fire risks. Personal protective equipment (PPE) includes or gloves, tightly fitting safety goggles, flame-retardant and antistatic clothing, and a with Filter A if exposure limits may be exceeded. For spills, evacuate the area, ventilate, and absorb the liquid with inert materials like sand or , avoiding ignition sources and preventing entry into drains. Tetramethyl orthosilicate is listed as an active substance on the Toxic Substances Control Act (TSCA) inventory and classified as a hazardous substance. It is regulated for transport under 2606 as methyl orthosilicate, with hazard class 6.1 (toxic) and subsidiary risk 3 (), packing group I. In case of exposure, measures emphasize immediate medical attention. For , move to fresh air and provide artificial respiration if needed; for skin contact, remove contaminated clothing and rinse with water; for eye exposure, flush with water for several minutes and consult an ophthalmologist; for ingestion, rinse mouth and seek professional help without inducing vomiting. Due to its producing toxic , or ingestion requires urgent medical evaluation.

References

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