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Silane
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| Names | |||
|---|---|---|---|
| IUPAC name
Silane
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| Systematic IUPAC name
Silicane | |||
Other names
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| Identifiers | |||
3D model (JSmol)
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| ChEBI | |||
| ChemSpider | |||
| ECHA InfoCard | 100.029.331 | ||
| 273 | |||
PubChem CID
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| RTECS number |
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| UNII | |||
| UN number | 2203 | ||
CompTox Dashboard (EPA)
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| Properties | |||
| H4Si | |||
| Molar mass | 32.117 g·mol−1 | ||
| Appearance | Colorless gas | ||
| Odor | Repulsive[1] | ||
| Density | 1.313 g/L[2] | ||
| Melting point | −185 °C (−301.0 °F; 88.1 K)[2] | ||
| Boiling point | −111.9 °C (−169.4 °F; 161.2 K)[2] | ||
| Reacts slowly[2] | |||
| Vapor pressure | >1 atm (20 °C)[1] | ||
| Conjugate acid | Silanium (sometimes spelled silonium) | ||
| Structure | |||
| Tetrahedral r(Si-H) = 1.4798 Å[3] | |||
| 0 D | |||
| Thermochemistry[4] | |||
Heat capacity (C)
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42.81 J/mol·K | ||
Std molar
entropy (S⦵298) |
204.61 J/mol·K | ||
Std enthalpy of
formation (ΔfH⦵298) |
34.31 kJ/mol | ||
Gibbs free energy (ΔfG⦵)
|
56.91 kJ/mol | ||
| Hazards | |||
| Occupational safety and health (OHS/OSH): | |||
Main hazards
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Extremely flammable, pyrophoric in air | ||
| GHS labelling: | |||
| Danger | |||
| H220 [5] | |||
| P210, P222, P230, P280, P377, P381, P403, P410+P403 | |||
| NFPA 704 (fire diamond) | |||
| Flash point | Not applicable, pyrophoric gas | ||
| ~ 18 °C (64 °F; 291 K) | |||
| Explosive limits | 1.37–100% | ||
| NIOSH (US health exposure limits): | |||
PEL (Permissible)
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None[1] | ||
REL (Recommended)
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TWA 5 ppm (7 mg/m3)[1] | ||
IDLH (Immediate danger)
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N.D.[1] | ||
| Safety data sheet (SDS) | ICSC 0564 | ||
| Related compounds | |||
Related tetrahydride compounds
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Methane Germane Stannane Plumbane | ||
Related compounds
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Phenylsilane Vinylsilane Disilane Trisilane | ||
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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Silane (Silicane) is an inorganic compound with chemical formula SiH4. It is a colorless, pyrophoric gas with a sharp, repulsive, pungent smell, somewhat similar to that of acetic acid.[6] Silane is of practical interest as a precursor to elemental silicon. Silanes with alkyl groups are effective water repellents for mineral surfaces such as concrete and masonry. Silanes with both organic and inorganic attachments are used as coupling agents. They are commonly used to apply coatings to surfaces or as an adhesion promoter.[7]
Production
[edit]Commercial-scale routes
[edit]Silane can be produced by several routes.[8] Typically, it arises from the reaction of hydrogen chloride with magnesium silicide:
- Mg2Si + 4 HCl → 2 MgCl2 + SiH4
It is also prepared from metallurgical-grade silicon in a two-step process. First, silicon is treated with hydrogen chloride at about 300 °C to produce trichlorosilane, HSiCl3, along with hydrogen gas, according to the chemical equation
- Si + 3 HCl → HSiCl3 + H2
The trichlorosilane is then converted to a mixture of silane and silicon tetrachloride:
- 4 HSiCl3 → SiH4 + 3 SiCl4
This redistribution reaction requires a catalyst.
The most commonly used catalysts for this process are metal halides, particularly aluminium chloride. This is referred to as a redistribution reaction, which is a double displacement involving the same central element. It may also be thought of as a disproportionation reaction, even though there is no change in the oxidation number for silicon (Si has a nominal oxidation number IV in all three species). However, the utility of the oxidation number concept for a covalent molecule[vague], even a polar covalent molecule, is ambiguous.[citation needed] The silicon atom could be rationalized as having the highest formal oxidation state and partial positive charge in SiCl4 and the lowest formal oxidation state in SiH4, since Cl is far more electronegative than is H.[citation needed]
An alternative industrial process for the preparation of very high-purity silane, suitable for use in the production of semiconductor-grade silicon, starts with metallurgical-grade silicon, hydrogen, and silicon tetrachloride and involves a complex series of redistribution reactions (producing byproducts that are recycled in the process) and distillations. The reactions are summarized below:
- Si + 2 H2 + 3 SiCl4 → 4 SiHCl3
- 2 SiHCl3 → SiH2Cl2 + SiCl4
- 2 SiH2Cl2 → SiHCl3 + SiH3Cl
- 2 SiH3Cl → SiH4 + SiH2Cl2
The silane produced by this route can be thermally decomposed to produce high-purity silicon and hydrogen in a single pass.
Still other industrial routes to silane involve reduction of silicon tetrafluoride (SiF4) with sodium hydride (NaH) or reduction of SiCl4 with lithium aluminium hydride (LiAlH4).
Another commercial production of silane involves reduction of silicon dioxide (SiO2) under Al and H2 gas in a mixture of NaCl and aluminum chloride (AlCl3) at high pressures:[9]
- 3 SiO2 + 6 H2 + 4 Al → 3 SiH4 + 2 Al2O3
Laboratory-scale routes
[edit]In 1857, the German chemists Heinrich Buff and Friedrich Woehler discovered silane among the products formed by the action of hydrochloric acid on aluminum silicide, which they had previously prepared. They called the compound siliciuretted hydrogen.[10]
For classroom demonstrations, silane can be produced by heating sand with magnesium powder to produce magnesium silicide (Mg2Si), then pouring the mixture into hydrochloric acid. The magnesium silicide reacts with the acid to produce silane gas, which burns on contact with air and produces tiny explosions.[11] This may be classified as a heterogeneous[clarification needed] acid–base chemical reaction, since the isolated Si4− ion in the Mg2Si antifluorite structure can serve as a Brønsted–Lowry base capable of accepting four protons. It can be written as
- 4 HCl + Mg2Si → SiH4 + 2 MgCl2
In general, the alkaline-earth metals form silicides with the following stoichiometries: MII2Si, MIISi, and MIISi2. In all cases, these substances react with Brønsted–Lowry acids to produce some type of hydride of silicon that is dependent on the Si anion connectivity in the silicide. The possible products include SiH4 and/or higher molecules in the homologous series SinH2n+2, a polymeric silicon hydride, or a silicic acid. Hence, MIISi with their zigzag chains of Si2− anions (containing two lone pairs of electrons on each Si anion that can accept protons) yield the polymeric hydride (SiH2)x.
Yet another small-scale route for the production of silane is from the action of sodium amalgam on dichlorosilane, SiH2Cl2, to yield monosilane along with some yellow polymerized silicon hydride (SiH)x.[12]
Properties
[edit]Silane is the silicon analogue of methane. All four Si−H bonds are equal and their length is 147.98 pm.[13] Because of the greater electronegativity of hydrogen in comparison to silicon, this Si–H bond polarity is the opposite of that in the C–H bonds of methane. One consequence of this reversed polarity is the greater tendency of silane to form complexes with transition metals. A second consequence is that silane is pyrophoric — it undergoes spontaneous combustion in air, without the need for external ignition.[14] However, the difficulties in explaining the available (often contradictory) combustion data are ascribed to the fact that silane itself is stable and that the natural formation of larger silanes during production, as well as the sensitivity of combustion to impurities such as moisture and to the catalytic effects of container surfaces causes its pyrophoricity.[15][16] Above 420 °C (788 °F), silane decomposes into silicon and hydrogen; it can therefore be used in the chemical vapor deposition of silicon.
The Si–H bond strength is around 384 kJ/mol, which is about 20% weaker than the H–H bond in H2. Consequently, compounds containing Si–H bonds are much more reactive than is H2. The strength of the Si–H bond is modestly affected by other substituents: the Si–H bond strengths are: SiHF3 419 kJ/mol, SiHCl3 382 kJ/mol, and SiHMe3 398 kJ/mol.[17][18]
Applications
[edit]
While diverse applications exist for organosilanes, silane itself has one dominant application, as a precursor to elemental silicon, particularly in the semiconductor industry. The higher silanes, such as di- and trisilane, are only of academic interest. About 300 metric tons per year of silane were consumed in the late 1990s.[needs update][16] Low-cost solar photovoltaic module manufacturing has led to substantial consumption of silane for depositing hydrogenated amorphous silicon (a-Si:H) on glass and other substrates like metal and plastic. The plasma-enhanced chemical vapor deposition (PECVD) process is relatively inefficient at materials utilization with approximately 85% of the silane being wasted. To reduce the waste and ecological footprint of a-Si:H-based solar cells further, several recycling efforts have been developed.[19][20]
Safety and precautions
[edit]A number of fatal industrial accidents produced by combustion and detonation of leaked silane in air have been reported.[21][22][23]
Silane is a pyrophoric gas (capable of autoignition at temperatures below 54 °C or 129 °F).[24]
- SiH4 + 2 O2 → SiO2 + 2 H2O
- SiH4 + O2 → SiO2 + 2 H2
- SiH4 + O2 → SiH2O + H2O
- 2 SiH4 + O2 → 2 SiH2O + 2 H2
- SiH2O + O2 → SiO2 + H2O
For lean mixtures a two-stage reaction process has been proposed, which consists of a silane consumption process and a hydrogen oxidation process. The heat of SiO2(s) condensation increases the burning velocity due to thermal feedback.[25]
Diluted silane mixtures with inert gases such as nitrogen or argon are even more likely to ignite when leaked into open air, compared to pure silane: even a 1% mixture of silane in pure nitrogen easily ignites when exposed to air.[26]
In Japan, in order to reduce the danger of silane for amorphous silicon solar cell manufacturing, several companies began to dilute silane with hydrogen gas. This resulted in a symbiotic benefit of making more stable solar photovoltaic cells as it reduced the Staebler–Wronski effect.[citation needed]
Unlike methane, silane is slightly toxic: the lethal concentration in air for rats (LC50) is 0.96% (9,600 ppm) over a 4-hour exposure. In addition, contact with eyes may form silicic acid with resultant irritation.[27]
In regards to occupational exposure of silane to workers, the US National Institute for Occupational Safety and Health has set a recommended exposure limit of 5 ppm (7 mg/m3) over an eight-hour time-weighted average.[28]
See also
[edit]- Binary silicon-hydrogen compounds (sometimes called silanes)
- Silanization
- Magnesium silicide
- Methane, in which carbon (in that compound) and silicon (in this compound) are together in the carbon group.
References
[edit]- ^ a b c d e NIOSH Pocket Guide to Chemical Hazards. "#0556". National Institute for Occupational Safety and Health (NIOSH).
- ^ a b c d Haynes, p. 4.87
- ^ Haynes, p. 9.29
- ^ Haynes, p. 5.14
- ^ Linde Safety Data Sheet
- ^ Greenwood, Norman N.; Earnshaw, Alan (1997). Chemistry of the Elements (2nd ed.). Butterworth-Heinemann. doi:10.1016/C2009-0-30414-6. ISBN 978-0-08-037941-8.
- ^ London, Gábor; Carroll, Gregory T.; Feringa, Ben L. (2013). "Silanization of quartz, silicon and mica surfaces with light-driven molecular motors: construction of surface-bound photo-active nanolayers". Organic & Biomolecular Chemistry. 11 (21): 3477–3483. doi:10.1039/c3ob40276b. ISSN 1477-0520. PMID 23592007. S2CID 33920329.
- ^ Simmler, W. "Silicon Compounds, Inorganic". Ullmann's Encyclopedia of Industrial Chemistry. Weinheim: Wiley-VCH. doi:10.1002/14356007.a24_001. ISBN 978-3-527-30673-2.
- ^ Shriver and Atkins. Inorganic Chemistry (5th edition). W. H. Freeman and Company, New York, 2010, p. 358.
- ^ Mellor, J. W. "A Comprehensive Treatise on Inorganic and Theoretical Chemistry", vol. VI, Longmans, Green and Co. (1947), p. 216.
- ^ "Making Silicon from Sand". Popular Science. Archived from the original on 2010-11-29 – via Theodore Gray..
- ^ Mellor, J. W. "A Comprehensive Treatise on Inorganic and Theoretical Chemistry", vol. VI. Longmans, Green and Co. (1947), pp. 970–971.
- ^ "Maintenance". NIST. 17 October 2019.
- ^ Emeléus, H. J. & Stewart, K. (1935). "The oxidation of the silicon hydrides". Journal of the Chemical Society: 1182–1189. doi:10.1039/JR9350001182.
- ^ Koda, S. (1992). "Kinetic Aspects of Oxidation and Combustion of Silane and Related Compounds". Progress in Energy and Combustion Science. 18 (6): 513–528. Bibcode:1992PECS...18..513K. doi:10.1016/0360-1285(92)90037-2.
- ^ a b Timms, P. L. (1999). "The chemistry of volatile waste from silicon wafer processing". Journal of the Chemical Society, Dalton Transactions (6): 815–822. doi:10.1039/a806743k.
- ^ M. A. Brook "Silicon in Organic, Organometallic, and Polymer Chemistry" 2000, J. Wiley, New York. ISBN 0-471-19658-4.
- ^ "Standard Bond Energies". Michigan State University Organic Chemistry.
- ^ Briend P, Alban B, Chevrel H, Jahan D. American Air, Liquide Inc. (2009) "Method for Recycling Silane (SiH4)". US20110011129, EP2252550A2 .
- ^ Kreiger, M.A.; Shonnard, D.R.; Pearce, J.M. (2013). "Life cycle analysis of silane recycling in amorphous silicon-based solar photovoltaic manufacturing". Resources, Conservation and Recycling. 70: 44–49. Bibcode:2013RCR....70...44K. doi:10.1016/j.resconrec.2012.10.002. S2CID 3961031. Archived from the original on 2017-11-12.
- ^ Chen, J. R. (2002). "Characteristics of fire and explosion in semiconductor fabrication processes". Process Safety Progress. 21 (1): 19–25. doi:10.1002/prs.680210106. S2CID 110162337.
- ^ Chen, J. R.; Tsai, H. Y.; Chen, S. K.; Pan, H. R.; Hu, S. C.; Shen, C. C.; Kuan, C. M.; Lee, Y. C. & Wu, C. C. (2006). "Analysis of a silane explosion in a photovoltaic fabrication plant". Process Safety Progress. 25 (3): 237–244. doi:10.1002/prs.10136. S2CID 111176344.
- ^ Chang, Y. Y.; Peng, D. J.; Wu, H. C.; Tsaur, C. C.; Shen, C. C.; Tsai, H. Y. & Chen, J. R. (2007). "Revisiting of a silane explosion in a photovoltaic fabrication plant". Process Safety Progress. 26 (2): 155–158. doi:10.1002/prs.10194. S2CID 110741985.
- ^ Silane MSDS Archived 2014-05-19 at the Wayback Machine
- ^ V.I Babushok (1998). "Numerical Study of Low and High Temperature Silane Combustion". The Combustion Institute. 27 (2): 2431–2439. doi:10.1016/S0082-0784(98)80095-7.
- ^ Kondo, S.; Tokuhashi, K.; Nagai, H.; Iwasaka, M. & Kaise, M. (1995). "Spontaneous Ignition Limits of Silane and Phosphine". Combustion and Flame. 101 (1–2): 170–174. Bibcode:1995CoFl..101..170K. doi:10.1016/0010-2180(94)00175-R.
- ^ "MSDS for silane" (PDF). vngas.com. Archived from the original on 2009-02-20.
- ^ "Silicon tetrahydride". NIOSH Pocket Guide to Chemical Hazards. Centers for Disease Control and Prevention. April 4, 2011. Archived from the original on July 26, 2014. Retrieved November 18, 2013.
Cited sources
[edit]- Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (92nd ed.). CRC Press. ISBN 978-1439855119.
External links
[edit]Silane
View on GrokipediaStructure and Properties
Molecular Structure
Silane has the chemical formula SiH₄ and serves as the silicon analog of methane (CH₄), representing the simplest member of the silicon hydride family.[2][4] The molecule adopts a tetrahedral geometry around the central silicon atom, with all four Si-H bonds equivalent and H-Si-H bond angles of approximately 109.5°. The Si-H bond length is 1.48 Å.[5] The Si-H bonds exhibit slight polarity due to the electronegativity difference between silicon (1.90) and hydrogen (2.20), resulting in a partial positive charge on the silicon atom and the reverse polarity compared to C-H bonds in methane.[4][6] The systematic and accepted IUPAC name for SiH₄ is silane, with the trivial name monosilane also in common use.[7][8] Isotopologues such as deuterated silane (SiD₄) are employed in spectroscopic studies to facilitate analysis of vibrational and rotational spectra; SiD₄ can be prepared via catalytic hydrogen-deuterium exchange reactions on silane or by analogous reduction methods using deuterated reagents.[9][10]Physical Properties
Silane is a colorless gas that is odorless in pure form but may exhibit a repulsive odor due to impurities at room temperature and atmospheric pressure. Its molecular weight of 32.117 g/mol contributes to its gaseous state under standard conditions.[11][12] Key thermodynamic properties of silane include a melting point of -185.4 °C and a boiling point of -111.9 °C, indicating it liquefies only at very low temperatures. The critical temperature is approximately -3 °C, above which silane cannot be liquefied regardless of pressure. At standard temperature and pressure (STP, 0 °C and 1 atm), its density is 1.44 g/L, roughly twice that of air, which affects its behavior in mixtures and containment systems.[2][11][13]| Property | Value | Conditions |
|---|---|---|
| Melting point | -185.4 °C | 1 atm |
| Boiling point | -111.9 °C | 1 atm |
| Critical temperature | -3 °C | - |
| Density | 1.44 g/L | STP (0 °C, 1 atm) |
Chemical Properties
Silane is thermodynamically unstable with respect to its constituent elements, silicon and hydrogen, possessing a standard enthalpy of formation (ΔH_f) of +34 kJ/mol at 298 K, yet it exhibits kinetic stability at room temperature owing to the high activation barrier for decomposition.[18] This kinetic inertness under ambient conditions contrasts with its pronounced reactivity when activated by heat, light, or oxidants. Due to its pyrophoricity, silane undergoes spontaneous ignition upon exposure to air, combusting according to the equation: This highly exothermic reaction underscores silane's sensitivity to atmospheric oxygen, limiting its handling to inert environments.[2] Silane displays limited reactivity toward water, undergoing slow hydrolysis to yield silicic acid and hydrogen gas via the reaction: This process is sluggish at room temperature but can be accelerated by the presence of impurities or basic catalysts, such as alkali hydroxides, which facilitate Si-H bond cleavage.[4][19] Upon heating above 400 °C, silane thermally decomposes into amorphous silicon and hydrogen, following the decomposition pathway: This endothermic process is central to its use in silicon deposition and occurs without catalysts under controlled thermal conditions.[2] Silane reacts vigorously with halogens such as chlorine and fluorine, rapidly forming the corresponding halosilanes; for instance, with chlorine, it proceeds as: These halogenation reactions are highly exothermic and typically require careful control to avoid explosive outcomes.[20] The Si-H bonds in silane exhibit weak acidity, attributable to the relatively low electronegativity of silicon and the polarizability of the Si-H linkage, enabling deprotonation by strong bases to afford silyl anions such as SiH₃⁻. This acid-base behavior facilitates the synthesis of organosilyl derivatives and highlights silane's role as a precursor in silyl chemistry.Production
Laboratory Methods
One common laboratory method for silane synthesis involves the reaction of magnesium silicide (Mg₂Si) with dilute hydrochloric acid, yielding silane gas according to the equation Mg₂Si + 4HCl → 2MgCl₂ + SiH₄.[21] This approach is suitable for small-scale preparation and begins with the preparation of magnesium silicide by heating magnesium powder with silicon or silica.[5][22] The reaction is typically conducted in a fume hood under inert conditions to manage the pyrophoric nature of the product, with the evolved gas collected over water or mercury.[22] An alternative laboratory route utilizes the reduction of silicon tetrachloride (SiCl₄) with lithium aluminum hydride (LiAlH₄) in an ether solvent, producing silane via SiCl₄ + LiAlH₄ → SiH₄ + LiCl + AlCl₃.[23] This method offers quantitative yields and high purity when performed at low temperatures, such as by adding SiCl₄ to a slurry of LiAlH₄ in diethyl ether cooled to 0°C, followed by warming and gas collection. It is favored in research for its straightforward setup and avoidance of silicide intermediates. Purification of laboratory-produced silane often involves trap-to-trap distillation under vacuum to separate volatile impurities, or passage through concentrated sulfuric acid to selectively remove phosphine (PH₃) contaminants arising from phosphorus traces in starting materials. Common contaminants include disilane (Si₂H₆), formed via side reactions or thermal decomposition, which can be isolated by fractional distillation exploiting the boiling point difference (-112°C for SiH₄ versus -14°C for Si₂H₆).Commercial Production
The primary commercial route for silane production involves the disproportionation of trichlorosilane (HSiCl₃) over heated silicon, yielding silane and silicon tetrachloride, followed by distillation to separate the products. This process operates according to the reaction , typically conducted at elevated temperatures around 300–400°C with silicon as a catalyst to drive the equilibrium toward silane formation. The resulting mixture is then purified through fractional distillation to isolate high-purity silane gas.[24][25] An alternative direct synthesis method starts from metallurgical-grade silicon, reacting it with hydrogen gas at high temperatures (above 1000°C) under plasma or catalytic conditions to produce silane via . This approach uses hydrogen and metallurgical silicon as primary feeds, but it suffers from low yields due to thermodynamic limitations and side reactions, making it less dominant than chlorosilane-based routes despite its potential for sustainability.[26] In integrated polysilicon manufacturing, silane is often generated on-site as an intermediate in some variants of the Siemens process or silane-based methods, where purified trichlorosilane undergoes redistribution reactions to silane, which is then pyrolyzed to deposit silicon onto heated rods. This on-site production minimizes transportation risks and aligns silane output with polysilicon demands in electronics fabrication.[28][29] For semiconductor applications, commercial silane achieves purity levels of 99.999% (5N), obtained through cryogenic distillation that effectively removes critical impurities such as boron and phosphorus to below 10 parts per billion.[30][31] Recent advancements include the adoption of fluidized-bed reactors in silane-related processes, which have reduced costs and improved energy efficiency by about 20% since 2015 through better heat transfer and continuous operation compared to batch methods.[32]Applications
Semiconductor Manufacturing
Silane, also known as monosilane (SiH₄), serves as a critical precursor in semiconductor manufacturing due to its ability to decompose into high-purity silicon under controlled conditions, enabling the fabrication of silicon-based devices essential for electronics and photovoltaics. Monosilane and disilane (Si₂H₆) are used as CVD gases for silicon film formation in low-temperature, high-speed deposition processes.[33] In chemical vapor deposition (CVD) processes, silane undergoes thermal decomposition at temperatures between 600°C and 700°C, following the reaction , to deposit polycrystalline silicon films. These films are widely used in wafer production for applications such as gate electrodes and interconnects in integrated circuits, providing uniform, low-stress layers with thicknesses typically ranging from 100 nm to several micrometers.[34] Doping applications leverage silane as the primary silicon source, combined with dopant gases like phosphine for n-type semiconductors or diborane for p-type semiconductors, to introduce controlled impurity levels during CVD. This in-situ doping method ensures precise carrier concentrations, often in the range of to atoms/cm³, which is vital for creating p-n junctions in transistors and diodes. For instance, phosphine-silane mixtures yield n-type films with enhanced electron mobility, while diborane-silane combinations produce p-type layers suitable for bipolar devices, improving overall device performance in microelectronics.[35][36] In solar cell production, plasma-enhanced CVD (PECVD) utilizes silane to deposit amorphous silicon layers at lower temperatures around 200–300°C, forming intrinsic or doped films for thin-film photovoltaic modules. This process enables the creation of p-i-n structures with bandgaps tailored for light absorption and is used in niche applications, including some tandem configurations integrating amorphous silicon with other materials.[37] Epitaxial growth employs low-pressure CVD (LPCVD) with silane to produce single-crystal silicon layers on substrates, essential for high-performance integrated circuits. Operating at pressures of 10–100 Torr and temperatures of 800–1100°C, this method achieves growth rates up to 10 μm/h, yielding defect-free films with thicknesses of 1–10 μm for advanced nodes. Silane's high reactivity allows selective epitaxial growth in device fabrication, minimizing defects like stacking faults and supporting the scaling of transistors in logic chips.[38] The market impact of silane underscores its importance in silicon precursor applications, driven by demand from advanced semiconductor chips and emerging perovskite-silicon tandem solar cells that rely on high-purity silicon substrates produced via silane CVD; as of 2024, record efficiencies exceeding 33% have been achieved in such tandems.[39] Global silane consumption in these areas is projected to grow at a CAGR of over 9% through 2033, reflecting its indispensable role in enabling miniaturization and efficiency gains in electronics and renewables.[40][41]Chemical and Other Uses
Silane serves as a key precursor in the synthesis of organosilicon compounds, particularly through hydrosilylation reactions where it adds to alkenes to form alkyl-substituted silanes. These reactions typically require transition metal catalysts and proceed by inserting the unsaturated bond across a Si-H linkage, enabling the production of intermediates for siloxanes and silicone polymers. A representative example is the hydrosilylation of ethylene, yielding ethylsilane: .[42] This methodology is widely applied in industrial routes to functionalize silicon for adhesives, coatings, and lubricants.[43] In pyrotechnics and rocketry, silane acts as an effective fuel additive owing to its exceptionally low ignition energy, approximately 0.01 mJ in air, which facilitates spontaneous and reliable ignition under high-energy conditions. NASA demonstrations have shown silane-hydrogen mixtures with oxygen providing robust ignition for rocket engines, reducing startup delays in propulsion systems.[44] Similarly, its pyrophoric nature supports ignition aids in scramjet fuels, enhancing combustion efficiency at concentrations as low as 2.5% in hydrogen.[45] Silane is also employed in the thermal oligomerization to generate higher silanes, starting with the formation of disilane () via pyrolysis at elevated temperatures around 400–500°C. This process involves dehydrogenative coupling of silane molecules and serves as a foundational step for synthesizing polysilanes, which are catenated silicon polymers used in photoresists, optical materials, and precursors for silicon carbide ceramics.[46] The reaction kinetics favor disilane as the primary product under controlled conditions, with further oligomerization yielding chains up to several silicon units.[47] In analytical chemistry, silane finds application in mass spectrometry for calibrating and resolving silicon isotopes, leveraging its volatility to generate ion beams from gaseous samples. Commercial silane is ionized to separate isotopes such as Si, Si, and Si in magnetic sector analyzers, achieving enrichments beyond 99.9998% for specialized uses like semiconductor quantum computing.[48] This technique provides high-precision isotopic ratios essential for geochemical and materials science studies.[49] Emerging roles for silane include its function as a reducing agent in the synthesis of silicon nanoparticles for lithium-ion battery anodes, where thermal decomposition of silane gas produces discrete nanoscale silicon particles that improve energy density.[50] Patents on silane-derived silicon materials for batteries have shown an increasing trend, with annual growth of approximately 15% since 2020, driven by demands for higher-capacity electrodes in electric vehicles.[51]Safety and Precautions
Health and Fire Hazards
Silane is highly toxic by inhalation, acting as a severe irritant to the respiratory tract and mucous membranes upon exposure. Inhalation of silane gas can cause symptoms including headache, nausea, coughing, and chest tightness, with high concentrations leading to pulmonary edema due to the formation of siliceous particles during combustion or decomposition. The median lethal concentration (LC50) for silane in rats via inhalation is 9600 ppm over 4 hours, indicating its acute toxicity at relatively low concentrations.[52][2] Chronic exposure to silane primarily poses risks through its combustion products rather than the gas itself, which is not directly classified as carcinogenic. However, inhalation of silica dust generated from silane combustion can lead to silicosis, a progressive lung disease, and is associated with increased lung cancer risk. Crystalline silica, a key combustion byproduct, is classified by the International Agency for Research on Cancer (IARC) as a Group 1 carcinogen, meaning it is carcinogenic to humans based on sufficient evidence from occupational exposure studies. Silane exposure is regulated to minimize these risks; the Occupational Safety and Health Administration (OSHA) has no permissible exposure limit (PEL) for silane, while the National Institute for Occupational Safety and Health (NIOSH) recommended exposure limit (REL) is 5 ppm as an 8-hour time-weighted average (TWA); the NIOSH immediately dangerous to life or health (IDLH) value is not determined (N.D.).[53] Silane presents extreme fire and explosion hazards due to its pyrophoric nature and wide flammability range. It is pyrophoric, igniting spontaneously in air at temperatures at or below 54°C, and can form explosive mixtures with lower and upper explosive limits of approximately 1% and 96% by volume, respectively, allowing ignition over nearly the entire concentration range in air.[54] Combustion of silane produces silica dust and hydrogen gas, both of which exacerbate hazards: the fine silica particles can disperse and cause respiratory issues, while hydrogen contributes to secondary explosions due to its own flammability. These properties necessitate stringent controls in environments where silane is present to prevent ignition from sparks, static electricity, or even elevated ambient temperatures.[55]Handling and Storage
Silane is typically stored in high-pressure cylinders constructed from passivated stainless steel to minimize decomposition reactions with the cylinder walls.[54] These cylinders must maintain a slight positive pressure of an inert gas, such as nitrogen or argon, to prevent air ingress and spontaneous ignition. Storage areas should keep temperatures below 50°C and segregate silane from oxidizers or incompatible materials to avoid hazardous interactions.[55] Safe handling of silane requires operations in controlled environments like glove boxes or fume hoods equipped with explosion-proof ventilation and electrical systems to mitigate ignition risks.[54] Personnel must use non-sparking tools and ground all equipment to prevent static discharge.[56] For transportation, silane is often diluted with inert gases to concentrations below 1% to reduce flammability hazards during transit.[55] In the event of a spill, immediately evacuate the area and ventilate to disperse vapors while monitoring for autoignition, particularly for small releases where controlled combustion may be safer than suppression attempts.[57] Water must not be used on spills or leaks, as it can react to produce hydrogen gas, exacerbating the fire risk.[54] Silane is classified by the U.S. Department of Transportation (DOT) as a Division 2.1 flammable gas under UN 2203, requiring specific labeling, packaging, and shipping protocols.[58] In the European Union, silane falls under REACH registration requirements for industrial manufacturers and importers exceeding one ton per year, ensuring compliance with chemical safety assessments.[59] Waste silane streams should be disposed of via flaring or catalytic combustion, converting the gas to silica and water vapor, in accordance with EPA emission control guidelines for hazardous gases.[55] Operators handling silane must receive specialized training, including the use of leak detection systems with silane sensors set to alarm at thresholds as low as 0.5 ppm to enable early response to potential releases.[60]References
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