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Silane
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Silane
Stereo structural formula of silane
Stereo structural formula of silane
Ball-and-stick model of silane
Ball-and-stick model of silane
Spacefill model of silane
Spacefill model of silane
Names
IUPAC name
Silane
Systematic IUPAC name
Silicane
Other names
  • Monosilane
  • Silicon(IV) hydride
  • Silicon tetrahydride
Identifiers
3D model (JSmol)
ChEBI
ChemSpider
ECHA InfoCard 100.029.331 Edit this at Wikidata
273
RTECS number
  • VV1400000
UNII
UN number 2203
  • InChI=1S/SiH4/h1H4 checkY
    Key: BLRPTPMANUNPDV-UHFFFAOYSA-N checkY
  • InChI=1/SiH4/h1H4
    Key: BLRPTPMANUNPDV-UHFFFAOYAE
  • [SiH4]
Properties
H4Si
Molar mass 32.117 g·mol−1
Appearance Colorless gas
Odor Repulsive[1]
Density 1.313 g/L[2]
Melting point −185 °C (−301.0 °F; 88.1 K)[2]
Boiling point −111.9 °C (−169.4 °F; 161.2 K)[2]
Reacts slowly[2]
Vapor pressure >1 atm (20 °C)[1]
Conjugate acid Silanium (sometimes spelled silonium)
Structure
Tetrahedral
r(Si-H) = 1.4798 Å[3]
0 D
Thermochemistry[4]
42.81 J/mol·K
204.61 J/mol·K
34.31 kJ/mol
56.91 kJ/mol
Hazards
Occupational safety and health (OHS/OSH):
Main hazards
Extremely flammable, pyrophoric in air
GHS labelling:
GHS02: Flammable
Danger
H220 [5]
P210, P222, P230, P280, P377, P381, P403, P410+P403
NFPA 704 (fire diamond)
NFPA 704 four-colored diamondHealth 1: Exposure would cause irritation but only minor residual injury. E.g. turpentineFlammability 4: Will rapidly or completely vaporize at normal atmospheric pressure and temperature, or is readily dispersed in air and will burn readily. Flash point below 23 °C (73 °F). E.g. propaneInstability 3: Capable of detonation or explosive decomposition but requires a strong initiating source, must be heated under confinement before initiation, reacts explosively with water, or will detonate if severely shocked. E.g. hydrogen peroxideSpecial hazards (white): no code
1
4
3
Flash point Not applicable, pyrophoric gas
~ 18 °C (64 °F; 291 K)
Explosive limits 1.37–100%
NIOSH (US health exposure limits):
PEL (Permissible)
None[1]
REL (Recommended)
TWA 5 ppm (7 mg/m3)[1]
IDLH (Immediate danger)
N.D.[1]
Safety data sheet (SDS) ICSC 0564
Related compounds
Related tetrahydride compounds
Methane
Germane
Stannane
Plumbane
Related compounds
Phenylsilane
Vinylsilane
Disilane
Trisilane
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
checkY verify (what is checkY☒N ?)

Silane (Silicane) is an inorganic compound with chemical formula SiH4. It is a colorless, pyrophoric gas with a sharp, repulsive, pungent smell, somewhat similar to that of acetic acid.[6] Silane is of practical interest as a precursor to elemental silicon. Silanes with alkyl groups are effective water repellents for mineral surfaces such as concrete and masonry. Silanes with both organic and inorganic attachments are used as coupling agents. They are commonly used to apply coatings to surfaces or as an adhesion promoter.[7]

Production

[edit]

Commercial-scale routes

[edit]

Silane can be produced by several routes.[8] Typically, it arises from the reaction of hydrogen chloride with magnesium silicide:

Mg2Si + 4 HCl → 2 MgCl2 + SiH4

It is also prepared from metallurgical-grade silicon in a two-step process. First, silicon is treated with hydrogen chloride at about 300 °C to produce trichlorosilane, HSiCl3, along with hydrogen gas, according to the chemical equation

Si + 3 HCl → HSiCl3 + H2

The trichlorosilane is then converted to a mixture of silane and silicon tetrachloride:

4 HSiCl3 → SiH4 + 3 SiCl4

This redistribution reaction requires a catalyst.

The most commonly used catalysts for this process are metal halides, particularly aluminium chloride. This is referred to as a redistribution reaction, which is a double displacement involving the same central element. It may also be thought of as a disproportionation reaction, even though there is no change in the oxidation number for silicon (Si has a nominal oxidation number IV in all three species). However, the utility of the oxidation number concept for a covalent molecule[vague], even a polar covalent molecule, is ambiguous.[citation needed] The silicon atom could be rationalized as having the highest formal oxidation state and partial positive charge in SiCl4 and the lowest formal oxidation state in SiH4, since Cl is far more electronegative than is H.[citation needed]

An alternative industrial process for the preparation of very high-purity silane, suitable for use in the production of semiconductor-grade silicon, starts with metallurgical-grade silicon, hydrogen, and silicon tetrachloride and involves a complex series of redistribution reactions (producing byproducts that are recycled in the process) and distillations. The reactions are summarized below:

  1. Si + 2 H2 + 3 SiCl4 → 4 SiHCl3
  2. 2 SiHCl3 → SiH2Cl2 + SiCl4
  3. 2 SiH2Cl2 → SiHCl3 + SiH3Cl
  4. 2 SiH3Cl → SiH4 + SiH2Cl2

The silane produced by this route can be thermally decomposed to produce high-purity silicon and hydrogen in a single pass.

Still other industrial routes to silane involve reduction of silicon tetrafluoride (SiF4) with sodium hydride (NaH) or reduction of SiCl4 with lithium aluminium hydride (LiAlH4).

Another commercial production of silane involves reduction of silicon dioxide (SiO2) under Al and H2 gas in a mixture of NaCl and aluminum chloride (AlCl3) at high pressures:[9]

3 SiO2 + 6 H2 + 4 Al → 3 SiH4 + 2 Al2O3

Laboratory-scale routes

[edit]

In 1857, the German chemists Heinrich Buff and Friedrich Woehler discovered silane among the products formed by the action of hydrochloric acid on aluminum silicide, which they had previously prepared. They called the compound siliciuretted hydrogen.[10]

For classroom demonstrations, silane can be produced by heating sand with magnesium powder to produce magnesium silicide (Mg2Si), then pouring the mixture into hydrochloric acid. The magnesium silicide reacts with the acid to produce silane gas, which burns on contact with air and produces tiny explosions.[11] This may be classified as a heterogeneous[clarification needed] acid–base chemical reaction, since the isolated Si4− ion in the Mg2Si antifluorite structure can serve as a Brønsted–Lowry base capable of accepting four protons. It can be written as

4 HCl + Mg2Si → SiH4 + 2 MgCl2

In general, the alkaline-earth metals form silicides with the following stoichiometries: MII2Si, MIISi, and MIISi2. In all cases, these substances react with Brønsted–Lowry acids to produce some type of hydride of silicon that is dependent on the Si anion connectivity in the silicide. The possible products include SiH4 and/or higher molecules in the homologous series SinH2n+2, a polymeric silicon hydride, or a silicic acid. Hence, MIISi with their zigzag chains of Si2− anions (containing two lone pairs of electrons on each Si anion that can accept protons) yield the polymeric hydride (SiH2)x.

Yet another small-scale route for the production of silane is from the action of sodium amalgam on dichlorosilane, SiH2Cl2, to yield monosilane along with some yellow polymerized silicon hydride (SiH)x.[12]

Properties

[edit]

Silane is the silicon analogue of methane. All four Si−H bonds are equal and their length is 147.98 pm.[13] Because of the greater electronegativity of hydrogen in comparison to silicon, this Si–H bond polarity is the opposite of that in the C–H bonds of methane. One consequence of this reversed polarity is the greater tendency of silane to form complexes with transition metals. A second consequence is that silane is pyrophoric — it undergoes spontaneous combustion in air, without the need for external ignition.[14] However, the difficulties in explaining the available (often contradictory) combustion data are ascribed to the fact that silane itself is stable and that the natural formation of larger silanes during production, as well as the sensitivity of combustion to impurities such as moisture and to the catalytic effects of container surfaces causes its pyrophoricity.[15][16] Above 420 °C (788 °F), silane decomposes into silicon and hydrogen; it can therefore be used in the chemical vapor deposition of silicon.

The Si–H bond strength is around 384 kJ/mol, which is about 20% weaker than the H–H bond in H2. Consequently, compounds containing Si–H bonds are much more reactive than is H2. The strength of the Si–H bond is modestly affected by other substituents: the Si–H bond strengths are: SiHF3 419 kJ/mol, SiHCl3 382 kJ/mol, and SiHMe3 398 kJ/mol.[17][18]

Applications

[edit]
Monosilane gas shipping containers in Japan.

While diverse applications exist for organosilanes, silane itself has one dominant application, as a precursor to elemental silicon, particularly in the semiconductor industry. The higher silanes, such as di- and trisilane, are only of academic interest. About 300 metric tons per year of silane were consumed in the late 1990s.[needs update][16] Low-cost solar photovoltaic module manufacturing has led to substantial consumption of silane for depositing hydrogenated amorphous silicon (a-Si:H) on glass and other substrates like metal and plastic. The plasma-enhanced chemical vapor deposition (PECVD) process is relatively inefficient at materials utilization with approximately 85% of the silane being wasted. To reduce the waste and ecological footprint of a-Si:H-based solar cells further, several recycling efforts have been developed.[19][20]

Safety and precautions

[edit]

A number of fatal industrial accidents produced by combustion and detonation of leaked silane in air have been reported.[21][22][23]

Silane is a pyrophoric gas (capable of autoignition at temperatures below 54 °C or 129 °F).[24]

SiH4 + 2 O2 → SiO2 + 2 H2O     
SiH4 + O2 → SiO2 + 2 H2
SiH4 + O2 → SiH2O + H2O
2 SiH4 + O2 → 2 SiH2O + 2 H2
SiH2O + O2 → SiO2 + H2O

For lean mixtures a two-stage reaction process has been proposed, which consists of a silane consumption process and a hydrogen oxidation process. The heat of SiO2(s) condensation increases the burning velocity due to thermal feedback.[25]

Diluted silane mixtures with inert gases such as nitrogen or argon are even more likely to ignite when leaked into open air, compared to pure silane: even a 1% mixture of silane in pure nitrogen easily ignites when exposed to air.[26]

In Japan, in order to reduce the danger of silane for amorphous silicon solar cell manufacturing, several companies began to dilute silane with hydrogen gas. This resulted in a symbiotic benefit of making more stable solar photovoltaic cells as it reduced the Staebler–Wronski effect.[citation needed]

Unlike methane, silane is slightly toxic: the lethal concentration in air for rats (LC50) is 0.96% (9,600 ppm) over a 4-hour exposure. In addition, contact with eyes may form silicic acid with resultant irritation.[27]

In regards to occupational exposure of silane to workers, the US National Institute for Occupational Safety and Health has set a recommended exposure limit of 5 ppm (7 mg/m3) over an eight-hour time-weighted average.[28]

See also

[edit]

References

[edit]

Cited sources

[edit]
[edit]
Revisions and contributorsEdit on WikipediaRead on Wikipedia
from Grokipedia
Silane is an with the SiH₄, representing the simplest of and serving as the silicon analogue of . Silane was first isolated in 1857 by the German chemists and Heinrich Buff, who obtained it from the reaction of aluminum silicide with . It is a colorless, pyrophoric gas that ignites spontaneously upon contact with air, exhibiting a sharp, repulsive odor and high toxicity by inhalation. With a , the central atom is bonded to four atoms at bond angles of approximately 109.5°, and a Si-H of 1.4798 . Silane is produced industrially through methods such as the reaction of (Mg₂Si) with (HCl), or by reducing (SiCl₄) with over a hot wire. These processes yield the gas, which must be handled under inert conditions due to its reactivity. Chemically, silane decomposes slowly in to form silicates and , and it reacts vigorously with oxidizing agents. The compound's primary applications lie in the , where it serves as a precursor for (CVD) to produce polycrystalline and films used in semiconductors, solar cells, and photovoltaic devices. Additionally, silane acts as a doping agent in solid-state devices and contributes to the synthesis of and carbide layers. Due to its extreme flammability and toxicity—classified with an LC50 of 9,600 ppm in rats—strict safety protocols, including ventilation and protective equipment, are essential in its handling.

Structure and Properties

Molecular Structure

Silane has the SiH₄ and serves as the silicon analog of (CH₄), representing the simplest member of the family. The molecule adopts a around the central atom, with all four Si-H bonds equivalent and H-Si-H bond angles of approximately 109.5°. The Si-H is 1.48 . The Si-H bonds exhibit slight polarity due to the electronegativity difference between (1.90) and (2.20), resulting in a partial positive charge on the silicon atom and the reverse polarity compared to C-H bonds in . The systematic and accepted IUPAC name for SiH₄ is , with the monosilane also in common use. Isotopologues such as deuterated silane (SiD₄) are employed in spectroscopic studies to facilitate analysis of vibrational and rotational spectra; SiD₄ can be prepared via catalytic hydrogen-deuterium exchange reactions on silane or by analogous reduction methods using deuterated reagents.

Physical Properties

Silane is a colorless gas that is odorless in pure form but may exhibit a repulsive odor due to impurities at and . Its molecular weight of 32.117 g/mol contributes to its gaseous state under standard conditions. Key thermodynamic properties of silane include a of -185.4 °C and a of -111.9 °C, indicating it liquefies only at very low temperatures. The critical temperature is approximately -3 °C, above which silane cannot be liquefied regardless of pressure. At (STP, 0 °C and 1 atm), its density is 1.44 g/L, roughly twice that of air, which affects its behavior in mixtures and containment systems.
PropertyValueConditions
Melting point-185.4 °C1
Boiling point-111.9 °C1
Critical temperature-3 °C-
Density1.44 g/LSTP (0 °C, 1 )
Silane is insoluble in , though it undergoes slow over time without rapid reaction under neutral conditions. It shows good solubility in organic solvents such as , reflecting its nonpolar nature and compatibility with non-aqueous media. At 25 °C, silane has a (Cp) of 42.8 J/mol·K for the gas phase, which is relevant for calculations in . Its thermal conductivity at similar conditions is approximately 0.018 W/m·K, typical for light diatomic-like gases but influenced by its tetrahedral . In comparison to (CH₄), silane displays a higher (-111.9 °C versus -161.5 °C for ) despite structural analogy, attributable to the larger atom increasing molecular and thus enhancing van der Waals intermolecular forces. This results in stronger attractions than might be anticipated from simple mass differences alone.

Chemical Properties

Silane is thermodynamically unstable with respect to its constituent elements, and , possessing a (ΔH_f) of +34 kJ/mol at 298 K, yet it exhibits kinetic stability at owing to the high barrier for . This kinetic inertness under ambient conditions contrasts with its pronounced reactivity when activated by , , or oxidants. Due to its , silane undergoes spontaneous ignition upon exposure to air, combusting according to the equation: \ceSiH4+2O2>SiO2+2H2O\ce{SiH4 + 2O2 -> SiO2 + 2H2O} This highly exothermic reaction underscores silane's sensitivity to atmospheric oxygen, limiting its handling to inert environments. Silane displays limited reactivity toward water, undergoing slow hydrolysis to yield silicic acid and hydrogen gas via the reaction: \ceSiH4+2H2O>SiO2+4H2\ce{SiH4 + 2H2O -> SiO2 + 4H2} This process is sluggish at room temperature but can be accelerated by the presence of impurities or basic catalysts, such as alkali hydroxides, which facilitate Si-H bond cleavage. Upon heating above 400 °C, silane thermally decomposes into and , following the decomposition pathway: \ceSiH4>Si+2H2\ce{SiH4 -> Si + 2H2} This endothermic process is central to its use in silicon deposition and occurs without catalysts under controlled thermal conditions. Silane reacts vigorously with such as and , rapidly forming the corresponding halosilanes; for instance, with chlorine, it proceeds as: \ceSiH4+4Cl2>SiCl4+4HCl\ce{SiH4 + 4Cl2 -> SiCl4 + 4HCl} These halogenation reactions are highly exothermic and typically require careful control to avoid explosive outcomes. The Si-H bonds in silane exhibit weak acidity, attributable to the relatively low electronegativity of silicon and the polarizability of the Si-H linkage, enabling deprotonation by strong bases to afford silyl anions such as SiH₃⁻. This acid-base behavior facilitates the synthesis of organosilyl derivatives and highlights silane's role as a precursor in silyl chemistry.

Production

Laboratory Methods

One common laboratory method for silane synthesis involves the reaction of (Mg₂Si) with dilute , yielding silane gas according to the equation Mg₂Si + 4HCl → 2MgCl₂ + SiH₄. This approach is suitable for small-scale preparation and begins with the preparation of by heating magnesium powder with or silica. The reaction is typically conducted in a under inert conditions to manage the pyrophoric nature of the product, with the evolved gas collected over water or mercury. An alternative laboratory route utilizes the reduction of (SiCl₄) with lithium aluminum hydride (LiAlH₄) in an , producing silane via SiCl₄ + LiAlH₄ → SiH₄ + LiCl + AlCl₃. This method offers quantitative yields and high purity when performed at low temperatures, such as by adding SiCl₄ to a of LiAlH₄ in cooled to 0°C, followed by warming and gas collection. It is favored in research for its straightforward setup and avoidance of intermediates. Purification of laboratory-produced silane often involves trap-to-trap under vacuum to separate volatile impurities, or passage through concentrated to selectively remove (PH₃) contaminants arising from traces in starting materials. Common contaminants include (Si₂H₆), formed via side reactions or , which can be isolated by exploiting the difference (-112°C for SiH₄ versus -14°C for Si₂H₆).

Commercial Production

The primary commercial route for silane production involves the of (HSiCl₃) over heated , yielding silane and , followed by to separate the products. This operates according to the reaction 4HSiCl3SiH4+3SiCl44 \mathrm{HSiCl_3} \rightarrow \mathrm{SiH_4} + 3 \mathrm{SiCl_4}, typically conducted at elevated temperatures around 300–400°C with as a catalyst to drive the equilibrium toward silane formation. The resulting mixture is then purified through to isolate high-purity silane gas. An alternative direct synthesis method starts from metallurgical-grade , reacting it with gas at high temperatures (above 1000°C) under plasma or catalytic conditions to produce silane via Si+2H2SiH4\mathrm{Si} + 2 \mathrm{H_2} \rightarrow \mathrm{SiH_4}. This approach uses and metallurgical as primary feeds, but it suffers from low yields due to thermodynamic limitations and side reactions, making it less dominant than chlorosilane-based routes despite its potential for . In integrated polysilicon manufacturing, silane is often generated on-site as an intermediate in some variants of the process or silane-based methods, where purified undergoes redistribution reactions to silane, which is then pyrolyzed to deposit onto heated rods. This on-site production minimizes transportation risks and aligns silane output with polysilicon demands in fabrication. For semiconductor applications, commercial silane achieves purity levels of 99.999% (5N), obtained through cryogenic that effectively removes critical impurities such as and to below 10 . Recent advancements include the adoption of fluidized-bed reactors in silane-related processes, which have reduced costs and improved energy efficiency by about 20% since 2015 through better and continuous operation compared to batch methods.

Applications

Semiconductor Manufacturing

Silane, also known as monosilane (SiH₄), serves as a critical precursor in manufacturing due to its ability to decompose into high-purity under controlled conditions, enabling the fabrication of silicon-based devices essential for and . Monosilane and disilane (Si₂H₆) are used as CVD gases for silicon film formation in low-temperature, high-speed deposition processes. In (CVD) processes, silane undergoes at temperatures between 600°C and 700°C, following the reaction SiH4Si+2H2\mathrm{SiH_4 \to Si + 2H_2}, to deposit films. These films are widely used in production for applications such as electrodes and interconnects in integrated circuits, providing uniform, low-stress layers with thicknesses typically ranging from 100 nm to several micrometers. Doping applications leverage silane as the primary source, combined with dopant gases like for n-type semiconductors or for p-type semiconductors, to introduce controlled impurity levels during CVD. This in-situ doping method ensures precise carrier concentrations, often in the range of 101510^{15} to 102010^{20} atoms/cm³, which is vital for creating p-n junctions in transistors and diodes. For instance, -silane mixtures yield n-type films with enhanced , while -silane combinations produce p-type layers suitable for bipolar devices, improving overall device performance in . In solar cell production, plasma-enhanced CVD (PECVD) utilizes silane to deposit layers at lower temperatures around 200–300°C, forming intrinsic or doped films for thin-film photovoltaic modules. This process enables the creation of p-i-n structures with bandgaps tailored for light absorption and is used in niche applications, including some tandem configurations integrating with other materials. Epitaxial growth employs low-pressure CVD (LPCVD) with to produce single-crystal layers on substrates, essential for high-performance integrated circuits. Operating at pressures of 10–100 and temperatures of 800–1100°C, this method achieves growth rates up to 10 μm/h, yielding defect-free films with thicknesses of 1–10 μm for advanced nodes. Silane's high reactivity allows selective epitaxial growth in device fabrication, minimizing defects like stacking faults and supporting the scaling of transistors in logic chips. The market impact of silane underscores its importance in silicon precursor applications, driven by demand from advanced chips and emerging perovskite-silicon tandem solar cells that rely on high-purity silicon substrates produced via silane CVD; as of 2024, record efficiencies exceeding 33% have been achieved in such tandems. Global silane consumption in these areas is projected to grow at a CAGR of over 9% through 2033, reflecting its indispensable role in enabling and gains in and renewables.

Chemical and Other Uses

Silane serves as a key precursor in the synthesis of organosilicon compounds, particularly through hydrosilylation reactions where it adds to alkenes to form alkyl-substituted silanes. These reactions typically require catalysts and proceed by inserting the unsaturated bond across a Si-H linkage, enabling the production of intermediates for siloxanes and polymers. A representative example is the hydrosilylation of , yielding ethylsilane: SiH4+C2H4C2H5SiH3SiH_4 + C_2H_4 \to C_2H_5SiH_3. This methodology is widely applied in industrial routes to functionalize for adhesives, coatings, and lubricants. In and rocketry, silane acts as an effective additive owing to its exceptionally low ignition energy, approximately 0.01 mJ in air, which facilitates spontaneous and reliable ignition under high-energy conditions. demonstrations have shown silane- mixtures with oxygen providing robust ignition for rocket engines, reducing startup delays in propulsion systems. Similarly, its pyrophoric nature supports ignition aids in s, enhancing combustion efficiency at concentrations as low as 2.5% in . Silane is also employed in the thermal oligomerization to generate higher silanes, starting with the formation of (Si2H6Si_2H_6) via at elevated temperatures around 400–500°C. This process involves dehydrogenative of silane molecules and serves as a foundational step for synthesizing polysilanes, which are catenated polymers used in photoresists, optical materials, and precursors for ceramics. The reaction kinetics favor disilane as the primary product under controlled conditions, with further oligomerization yielding chains up to several silicon units. In , silane finds application in for calibrating and resolving silicon isotopes, leveraging its volatility to generate ion beams from gaseous samples. Commercial silane is ionized to separate isotopes such as 28^{28}Si, 29^{29}Si, and 30^{30}Si in magnetic sector analyzers, achieving enrichments beyond 99.9998% for specialized uses like . This technique provides high-precision isotopic ratios essential for geochemical and studies. Emerging roles for silane include its function as a in the synthesis of nanoparticles for lithium-ion battery anodes, where thermal decomposition of silane gas produces discrete nanoscale particles that improve . Patents on silane-derived materials for batteries have shown an increasing trend, with annual growth of approximately 15% since 2020, driven by demands for higher-capacity electrodes in electric vehicles.

Safety and Precautions

Health and Fire Hazards

Silane is highly toxic by , acting as a severe irritant to the and mucous membranes upon exposure. Inhalation of silane gas can cause symptoms including , , coughing, and chest tightness, with high concentrations leading to due to the formation of siliceous particles during or . The lethal concentration (LC50) for silane in rats via is 9600 ppm over 4 hours, indicating its at relatively low concentrations. Chronic exposure to silane primarily poses risks through its products rather than the gas itself, which is not directly classified as carcinogenic. However, of silica dust generated from silane can lead to , a progressive , and is associated with increased risk. Crystalline silica, a key byproduct, is classified by the International Agency for Research on Cancer (IARC) as a , meaning it is carcinogenic to humans based on sufficient evidence from occupational exposure studies. Silane exposure is regulated to minimize these risks; the (OSHA) has no (PEL) for silane, while the National Institute for Occupational Safety and Health (NIOSH) (REL) is 5 ppm as an 8-hour time-weighted average (TWA); the NIOSH immediately dangerous to or health (IDLH) value is not determined (N.D.). Silane presents extreme fire and explosion hazards due to its pyrophoric nature and wide flammability range. It is pyrophoric, igniting spontaneously in air at temperatures at or below 54°C, and can form explosive mixtures with lower and upper explosive limits of approximately 1% and 96% by volume, respectively, allowing ignition over nearly the entire concentration range in air. Combustion of silane produces silica dust and hydrogen gas, both of which exacerbate hazards: the fine silica particles can disperse and cause respiratory issues, while hydrogen contributes to secondary explosions due to its own flammability. These properties necessitate stringent controls in environments where silane is present to prevent ignition from sparks, static electricity, or even elevated ambient temperatures.

Handling and Storage

Silane is typically stored in high-pressure cylinders constructed from passivated to minimize decomposition reactions with the cylinder walls. These cylinders must maintain a slight positive of an , such as or , to prevent air ingress and spontaneous ignition. Storage areas should keep temperatures below 50°C and segregate silane from oxidizers or incompatible materials to avoid hazardous interactions. Safe handling of silane requires operations in controlled environments like glove boxes or fume hoods equipped with explosion-proof ventilation and electrical systems to mitigate ignition risks. Personnel must use non-sparking tools and ground all equipment to prevent static discharge. For transportation, silane is often diluted with inert gases to concentrations below 1% to reduce flammability hazards during transit. In the event of a spill, immediately evacuate the area and ventilate to disperse vapors while monitoring for autoignition, particularly for small releases where controlled may be safer than suppression attempts. must not be used on spills or leaks, as it can react to produce gas, exacerbating the risk. Silane is classified by the U.S. (DOT) as a Division 2.1 flammable gas under UN 2203, requiring specific labeling, , and shipping protocols. In the , silane falls under REACH registration requirements for industrial manufacturers and importers exceeding one ton per year, ensuring compliance with assessments. Waste silane streams should be disposed of via flaring or catalytic combustion, converting the gas to silica and water vapor, in accordance with EPA emission control guidelines for hazardous gases. Operators handling silane must receive specialized training, including the use of leak detection systems with silane sensors set to alarm at thresholds as low as 0.5 ppm to enable early response to potential releases.

References

  1. https://www.[mdpi](/page/MDPI).com/2673-9623/3/1/7
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